States » SouthPosted at: May 29 2021 4:58PM


SRM, AP student granted copyright for Design of Face Shield

Vijayawada, May 29 (UNI) When the Covid-19 outbreak crippled the world, P Mohan Aditya, a 3rd-year Mechanical Engineering student from SRM University, AP, took giant steps into developing the highly useful face shield made from biodegradable substances.
He named it "Facial Shield 2.0'', as it was an improved version of the ordinary face shields. The innovative features added to it helped him to earn the ‘copyright’ to his credit.
On May 16, 2020, Aditya filed an application on the face shield design under the IPR (Intellectual Property Rights) with Indian Patent Office located in Kolkata, India.
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Tags: #SRM# AP student granted copyright for Design of Face Shield
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